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RF & DC Magnetron Sputtering with Thermal Evaporation System

Technical Specifications

Model Name

Auto 500

Manufacturer

HHV Advance Technologies Pvt. Ltd.

RF & DC Magnetron Sputtering with Thermal Evaporation System

About:

The Auto 500 system combines RF and DC magnetron sputtering with thermal evaporation capabilities, enabling the growth or deposition of uniform thin films on substrates. It supports various deposition parameters, such as substrate temperature, environment, deposition rate, power, and substrate-to-target distance.

Salient Features

Versatile front-loading coating system with a box chamber.

Equipped with RF (300W, 13.56 MHz) and DC (1KW) magnetron sources for diverse thin film applications.

Adjustable substrate temperature from room temperature to 500°C.

Thin film deposition under Argon and Nitrogen environments.

Key Applications

Anti-reflective coatings
Semiconductor industries
Photonics research
Compound semiconductors
Solar cells
Nanotechnology

"Achieve Unmatched Thin Film Quality with Auto 500. Elevate Your Research with Precision Deposition Techniques."